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MOS管High-k材料用量有所增多-行業數據

MOS管High-k材料用量有所增多
MOS管High-k材料用量有所增多
DRAM 線寬越細，High-k 材料用的越多。未來隨著半導體技術的發展，對 High-K 材料的需求將攀升。隨著制程微縮，電容的深寬比倍數增加，需要單位價值量更高的 High-k 材料降低高深寬比刻蝕產生的各種缺陷。
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MOS管High-k材料用量有所增多_第1頁
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MOS管High-k材料用量有所增多_第8頁
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MOS管High-k材料用量有所增多_第12頁
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MOS管High-k材料用量有所增多_第14頁
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所屬報告： 電子行業半導體技術前瞻專題系列之一：AI半導體的新結構、新工藝、新材料與投資建議-240108（17頁）.pdf
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